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Q2M Compound+ REDEFINED
Q²M Compound+ Redefined delivers higher cutting power without the typical heavy defects. The water-based formula contains high-quality Japanese abrasives that make removing stubborn defects fast and easy.
Free of silicones or fillers, it significantly speeds up and simplifies the process of preparing for coating and removing polish residue.
| CAPACITY | 250 ml, 120 ml, 1 L |
| USAGE | Polishing |
| TYPE | Heavy-cut compound |
| CONSUMPTION | 15 - 40 ml per panel |
| CUTTING POWER | 6/6 |
| FINSIHING POWER | 4/6 |
| LINE | Q2M |
| EAN | 8809432673798 |
Documents (Safety Data Sheets)
GYEON Q2M COMPOUND+ REDEFINED
What is so special about the Q2M Compound+?
GYEON Q²M Compound+ Redefined is an extremely powerful polishing compound developed to quickly and effectively remove heavy paint damage, deep scratches, and sanding marks (down to P1500 grit). The updated Redefined formula offers even higher "cut" with minimal dust generation and improved lubrication, allowing you to work for longer periods without the product drying out.
Despite its immense corrective power, this compound leaves a surprisingly clean finish, which significantly shortens the subsequent step with a finer polish. It is water-based and contains no silicones or fillers, allowing you to see the true results immediately.
MANUAL
How do you use Q2M Compound+?
Apply 3 to 4 drops of Compound+ to a hard polishing pad (such as the Q²M Eccentric Cut or Wool Pad). Work on a small area of approximately 40x40 cm. Spread the product at a low speed and then increase the speed for the correction phase. Polish with constant movements until the scratches are removed and the product becomes transparent. Remove the residue with a clean microfiber cloth and check the result with Q²M Prep. For a perfect mirror finish, it is recommended to follow up with a finer polish such as Q²M Polish.